Neil Curson is a Lecturer at UCL in the Department of Electrical Engineering and is a PI in the LCN. His research interests are centred around understanding and controlling the behaviour of atoms and molecules at surfaces and the development and deployment of new scanning probe lithography techniques, towards fabrication of nanoscale electronic devices and atomic-scale components for quantum information processing. He was a key member of the team at the University of New South Wales that pioneered atomically-controlled placement of individual P dopants into silicon and the electrical contacting of buried dopant nanostructures. Dr Curson’s experimental expertise lies in the determination of surface properties (scanning tunnelling microscopy, atomic force microscopy and its various derivatives, secondary ion mass spectroscopy, Auger electron spectroscopy, low energy electron diffraction etc.) and the fabrication of nanoscale devices (electron beam lithography and cleanroom processing).